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DC Field | Value | Language |
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dc.contributor.author | Ambartsumov, M. G. | - |
dc.contributor.author | Амбарцумов, М. Г. | - |
dc.contributor.author | Tarala, V. A. | - |
dc.contributor.author | Тарала, В. А. | - |
dc.contributor.author | Krandievsky, S. O. | - |
dc.contributor.author | Крандиевский, С. О. | - |
dc.contributor.author | Kravtsov, A. A. | - |
dc.contributor.author | Кравцов, А. А. | - |
dc.contributor.author | Saytiev, A. B. | - |
dc.contributor.author | Саутиев, А. Б. | - |
dc.contributor.author | Mitrofanenko, L. M. | - |
dc.contributor.author | Митрофаненко, Л. М. | - |
dc.date.accessioned | 2019-12-09T12:27:16Z | - |
dc.date.available | 2019-12-09T12:27:16Z | - |
dc.date.issued | 2019 | - |
dc.identifier.citation | Ambartsumov, M.G., Tarala, V.A., Krandievsky, S.O., Kravtsov, A.A., Sautiev, A.B., Mitrofanenko, L.M. The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles // Surface and Coatings Technology. - 2019. - Volume 378. - Номер статьи 124744 | ru |
dc.identifier.uri | https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm= | - |
dc.identifier.uri | http://hdl.handle.net/20.500.12258/9109 | - |
dc.description.abstract | Within the framework of the study, oriented aluminum nitride coatings were obtained on sapphire with orientation along the direction (0001) using the PEALD method at a temperature of 250°С and a number of deposition cycles from 80 to 500. The obtained samples were studied using ellipsometry, X-ray diffraction, and atomic force microscopy. It was shown that with an increase in the thickness of the coating, the refraction index increases to 2.02, and the root-mean-square (RMS) increases from 0.35 to 2.35 nm. All samples had (0002) and (0004) reflexes on X-ray diffractograms measured in the Bragg-Brentano geometry (θ/2θ-scan). On Δω-scans of the reflex (0002), the full width at half maximum (FWHM) amounted to 162 ± 7 arcsec | ru |
dc.language.iso | en | ru |
dc.publisher | Elsevier B.V. | ru |
dc.relation.ispartofseries | Surface and Coatings Technology | - |
dc.subject | AFM | ru |
dc.subject | AlN | ru |
dc.subject | Atomic layer deposition | ru |
dc.subject | Ellipsometry | ru |
dc.subject | PEALD | ru |
dc.subject | X-ray diffraction | ru |
dc.subject | Aluminum coated steel | ru |
dc.subject | Aluminum nitride | ru |
dc.subject | Atomic force microscopy | ru |
dc.subject | Aluminum coatings | ru |
dc.title | The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles | ru |
dc.type | Статья | ru |
vkr.inst | Инженерный институт | - |
vkr.inst | Гуманитарный институт | - |
Appears in Collections: | Статьи, проиндексированные в SCOPUS, WOS |
Files in This Item:
File | Description | Size | Format | |
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scopusresults 1122 .pdf Restricted Access | 1.69 MB | Adobe PDF | View/Open | |
WoS 767 .pdf Restricted Access | 75.01 kB | Adobe PDF | View/Open |
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