Please use this identifier to cite or link to this item:
https://dspace.ncfu.ru/handle/20.500.12258/3686
Title: | Growing aluminum nitride films by plasma-enhanced atomic layer deposition at low temperatures |
Authors: | Tarala, V. A. Тарала, В. А. Altakhov, A. S. Алтахов, А. С. Martens, V. Y. Мартенс, В. Я. Lisitsyn, S. V. Лисицын, С. В. |
Keywords: | Aluminum;Aluminum coatings;Aluminum nitride;Atomic layer deposition;Crystalline materials;Deposition;Electric discharges;Gas discharge tubes;Nitrides;Plasma theory;Film growth |
Issue Date: | 2015 |
Publisher: | Institute of Physics Publishing |
Citation: | Tarala, V.A., Altakhov, A.S., Martens, V.Y., Lisitsyn, S.V. Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures // Journal of Physics: Conference Series. - 2015. - Volume 652. - Issue 1. - Номер статьи 012034 |
Series/Report no.: | Journal of Physics: Conference Series |
Abstract: | Aluminum nitride films have been grown by Plasma-Enhanced Atomic Layer Deposition method. It was found that at temperatures of 250°C and 280°C increase of the plasma exposure step duration over 6 s, as well as increase of reactor purge step duration over 1 s does not affect the growth rate, however, it affects the microstructure of the films. It was found that crystalline aluminum nitride films deposit with plasma exposure duration over 10 s and the reactor purging over 10 s. When the temperature drops the increase of reactor purge step duration and plasma exposure step duration over 20 s is required for crystalline AlN film growth |
URI: | https://www.scopus.com/record/display.uri?eid=2-s2.0-84957824585&origin=resultslist&sort=plf-f&src=s&nlo=1&nlr=20&nls=afprfnm-t&affilName=north+caucasus+federal+university&sid=dc7f8c6f40c1112203ece798567bdeb2&sot=afnl&sdt=cl&cluster=scopubyr%2c%222015%22%2ct&sl=53&s=%28AF-ID%28%22North+Caucasus+Federal+University%22+60070541%29%29&relpos=5&citeCnt=1&searchTerm= http://hdl.handle.net/20.500.12258/3686 |
Appears in Collections: | Статьи, проиндексированные в SCOPUS, WOS |
Files in This Item:
File | Description | Size | Format | |
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scopusresults 652 .pdf Restricted Access | 63.42 kB | Adobe PDF | View/Open | |
WoS 425 .pdf Restricted Access | 1.29 MB | Adobe PDF | View/Open |
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