Please use this identifier to cite or link to this item: https://dspace.ncfu.ru/handle/20.500.12258/6920
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dc.contributor.authorSysoev, I. A.-
dc.contributor.authorСысоев, И. А.-
dc.contributor.authorGusev, D. A.-
dc.contributor.authorГусев, Д. А.-
dc.date.accessioned2019-09-04T09:03:30Z-
dc.date.available2019-09-04T09:03:30Z-
dc.date.issued2019-
dc.identifier.citationLunina, ML; Lunin, LS ; Sysoev, IA; Gusev, DA; Kazakova, AE. Ion-Beam Crystallization of InGaAs Island Nanostructures on GaAs Substrates // CRYSTALLOGRAPHY REPORTS. - 2019. - Том: 64. - Выпуск: 4. - Стр.: 649-655ru
dc.identifier.urihttp://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=GeneralSearch&qid=7&SID=E471anh4cEh9AHVwVNL&page=1&doc=1-
dc.identifier.urihttp://hdl.handle.net/20.500.12258/6920-
dc.description.abstractThe possibility of growing arrays of InxGa1-xAs nanocrystals on GaAs substrates by ion-beam deposition is experimentally shown. The influence of the ion energy, current density, and deposition time of sputtered materials on the height, lateral size, and density of arrays of InxGa1-xAs nanocrystals is investigated. The possibilities of changing controllably the deposition parameters of InxGa1-xAs(GaAs) nanocrystals are analyzed. The technological growth parameters of InGaAs nanofilms on GaAs are determined. The composition, structural quality, and photoluminescence of InxGa1-xAs nanocrystals and films grown on GaAs are studiedru
dc.language.isoenru
dc.publisherPLEIADES PUBLISHING INCru
dc.relation.ispartofseriesCRYSTALLOGRAPHY REPORTS-
dc.subjectOptical-propertiesru
dc.subjectHeterostructuresru
dc.titleIon-beam crystallization of inGaAs island nanostructures on GaAs substratesru
dc.typeСтатьяru
vkr.amountСтр.: 649-655ru
vkr.instИнженерный институт-
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