Please use this identifier to cite or link to this item: http://hdl.handle.net/20.500.12258/9109
Title: The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles
Authors: Ambartsumov, M. G.
Амбарцумов, М. Г.
Tarala, V. A.
Тарала, В. А.
Krandievsky, S. O.
Крандиевский, С. О.
Kravtsov, A. A.
Кравцов, А. А.
Saytiev, A. B.
Саутиев, А. Б.
Mitrofanenko, L. M.
Митрофаненко, Л. М.
Keywords: AFM;AlN;Atomic layer deposition;Ellipsometry;PEALD;X-ray diffraction;Aluminum coated steel;Aluminum nitride;Atomic force microscopy;Aluminum coatings
Issue Date: 2019
Publisher: Elsevier B.V.
Citation: Ambartsumov, M.G., Tarala, V.A., Krandievsky, S.O., Kravtsov, A.A., Sautiev, A.B., Mitrofanenko, L.M. The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles // Surface and Coatings Technology. - 2019. - Volume 378. - Номер статьи 124744
Series/Report no.: Surface and Coatings Technology
Abstract: Within the framework of the study, oriented aluminum nitride coatings were obtained on sapphire with orientation along the direction (0001) using the PEALD method at a temperature of 250°С and a number of deposition cycles from 80 to 500. The obtained samples were studied using ellipsometry, X-ray diffraction, and atomic force microscopy. It was shown that with an increase in the thickness of the coating, the refraction index increases to 2.02, and the root-mean-square (RMS) increases from 0.35 to 2.35 nm. All samples had (0002) and (0004) reflexes on X-ray diffractograms measured in the Bragg-Brentano geometry (θ/2θ-scan). On Δω-scans of the reflex (0002), the full width at half maximum (FWHM) amounted to 162 ± 7 arcsec
URI: https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm=
http://hdl.handle.net/20.500.12258/9109
Appears in Collections:Статьи, проиндексированные в SCOPUS, WOS

Files in This Item:
File Description SizeFormat 
scopusresults 1122 .pdf1.69 MBAdobe PDFView/Open
WoS 767 .pdf75.01 kBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.