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Title: | The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles |
Authors: | Ambartsumov, M. G. Амбарцумов, М. Г. Tarala, V. A. Тарала, В. А. Krandievsky, S. O. Крандиевский, С. О. Kravtsov, A. A. Кравцов, А. А. Saytiev, A. B. Саутиев, А. Б. Mitrofanenko, L. M. Митрофаненко, Л. М. |
Keywords: | AFM;AlN;Atomic layer deposition;Ellipsometry;PEALD;X-ray diffraction;Aluminum coated steel;Aluminum nitride;Atomic force microscopy;Aluminum coatings |
Issue Date: | 2019 |
Publisher: | Elsevier B.V. |
Citation: | Ambartsumov, M.G., Tarala, V.A., Krandievsky, S.O., Kravtsov, A.A., Sautiev, A.B., Mitrofanenko, L.M. The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles // Surface and Coatings Technology. - 2019. - Volume 378. - Номер статьи 124744 |
Series/Report no.: | Surface and Coatings Technology |
Abstract: | Within the framework of the study, oriented aluminum nitride coatings were obtained on sapphire with orientation along the direction (0001) using the PEALD method at a temperature of 250°С and a number of deposition cycles from 80 to 500. The obtained samples were studied using ellipsometry, X-ray diffraction, and atomic force microscopy. It was shown that with an increase in the thickness of the coating, the refraction index increases to 2.02, and the root-mean-square (RMS) increases from 0.35 to 2.35 nm. All samples had (0002) and (0004) reflexes on X-ray diffractograms measured in the Bragg-Brentano geometry (θ/2θ-scan). On Δω-scans of the reflex (0002), the full width at half maximum (FWHM) amounted to 162 ± 7 arcsec |
URI: | https://www.scopus.com/record/display.uri?eid=2-s2.0-85075729953&origin=resultslist&sort=plf-f&src=s&st1=The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles&st2=&sid=74064f1f4b25bf0f5642e6da8f07737a&sot=b&sdt=b&sl=162&s=TITLE-ABS-KEY%28The+dependence+of+aluminum+nitride+thin-film+microstructure+on+the+number+of+low-temperature+plasma-enhanced+atomic+layer+deposition+process+cycles%29&relpos=0&citeCnt=0&searchTerm= http://hdl.handle.net/20.500.12258/9109 |
Appears in Collections: | Статьи, проиндексированные в SCOPUS, WOS |
Files in This Item:
File | Description | Size | Format | |
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scopusresults 1122 .pdf Restricted Access | 1.69 MB | Adobe PDF | View/Open | |
WoS 767 .pdf Restricted Access | 75.01 kB | Adobe PDF | View/Open |
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