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DC Field | Value | Language |
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dc.contributor.author | Valyukhov, D. P. | - |
dc.contributor.author | Валюхов, Д. П. | - |
dc.contributor.author | Baklanov, I. S. | - |
dc.contributor.author | Бакланов, И. С. | - |
dc.contributor.author | Shtab, E. V. | - |
dc.contributor.author | Штаб, Э. В. | - |
dc.contributor.author | Shtab, A. V. | - |
dc.contributor.author | Штаб, А. В. | - |
dc.contributor.author | Pigulev, R. V. | - |
dc.contributor.author | Пигулев, Р. В. | - |
dc.contributor.author | Iliasov, A. S. | - |
dc.contributor.author | Ильясов, А. Ш. | - |
dc.date.accessioned | 2020-01-30T08:53:13Z | - |
dc.date.available | 2020-01-30T08:53:13Z | - |
dc.date.issued | 2019 | - |
dc.identifier.citation | Valiukhov, D.P., Baklanov, I.S., Shtab, E.V., Shtab, A.V., Pigulev, R.V., Iliasov, A.S. Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology // Journal of Physics: Conference Series. - 2019. - Volume 1384. - Issue 1. - Номер статьи 012002 | ru |
dc.identifier.uri | https://www.scopus.com/record/display.uri?eid=2-s2.0-85077954308&origin=resultslist&sort=plf-f&src=s&st1=Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology&st2=&sid=06bfe297a5d6aa23ab9ecf239eeb9ff0&sot=b&sdt=b&sl=137&s=TITLE-ABS-KEY%28Resonant-frequency+properties+of+low-dimensional+junction+of+semiconductor-metal-semiconductor+and+calculation+methodology%29&relpos=0&citeCnt=0&searchTerm= | - |
dc.identifier.uri | http://hdl.handle.net/20.500.12258/11217 | - |
dc.description.abstract | The article describes frequency characteristics of semiconductor-metal-semiconductor Si-Ag-Si structures (ohmic contacts) having metal nanolayers as well as features of resonance phenomenon and sandwich structure energy interaction. Mathematical simulation of mentioned above processes is provided. The limiting factor for resonance process is determined. It is found that the resonance frequency is a subject of semiconductor-metal junction parameters while metal layer thickness impact is minor | ru |
dc.language.iso | en | ru |
dc.publisher | Institute of Physics Publishing | ru |
dc.relation.ispartofseries | Journal of Physics: Conference Series | - |
dc.subject | Semiconducting silicon compounds | ru |
dc.subject | Silver compounds | ru |
dc.subject | Research laboratories | ru |
dc.subject | Metals | ru |
dc.subject | Natural frequencies | ru |
dc.subject | Ohmic contacts | ru |
dc.subject | Quality control | ru |
dc.title | Resonant-frequency properties of low-dimensional junction of semiconductor-metal-semiconductor and calculation methodology | ru |
dc.type | Статья | ru |
vkr.inst | Гуманитарный институт | ru |
vkr.inst | Инженерный институт | ru |
Appears in Collections: | Статьи, проиндексированные в SCOPUS, WOS |
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File | Size | Format | |
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scopusresults 1157 .pdf Restricted Access | 823.96 kB | Adobe PDF | View/Open |
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