Please use this identifier to cite or link to this item:
https://dspace.ncfu.ru/handle/20.500.12258/11480
Title: | Ion-beam deposition of thin AlN films on Al2O3 substrate |
Authors: | Devitsky, O. V. Девицкий, О. В. Sysoev, I. A. Сысоев, И. А. Kasyanov, I. V. Касьянов, И. В. Nikulin, D. A. Никулин, Д. А. |
Keywords: | Ion-beam deposition;Gallium nitride;Sapphire;Aluminum nitride;Wide-bandgap semiconductors |
Issue Date: | 2019 |
Publisher: | MAIK NAUKA/INTERPERIODICA/SPRINGER |
Citation: | Lunin, LS; Devitskii, OV; Sysoev, IA; Pashchenko, AS; Kas'yanov, IV; Nikulin, DA; Irkha, VA. Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate // TECHNICAL PHYSICS LETTERS. - 2019. - Том: 45. - Выпуск: 12. - Стр.: 1237-1240 |
Series/Report no.: | Technical Physics Letters |
Abstract: | Thin aluminum nitride (AlN) films on sapphire (Al2O3) substrates were grown by means of ion-beam deposition (IBD) and studied by methods of scanning electron microscopy, Raman scattering, and optical transmission spectroscopy. Results revealed the influence of IBD process parameters (gas mixture composition, ion beam energy, and substrate temperature) on the morphology, structure, and optical properties of obtained thin AlN films on sapphire |
URI: | http://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=GeneralSearch&qid=17&SID=E1foOAlVMmMF3jxHUZa&page=1&doc=1 http://hdl.handle.net/20.500.12258/11480 |
Appears in Collections: | Статьи, проиндексированные в SCOPUS, WOS |
Files in This Item:
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WoS 777 .pdf Restricted Access | 562.04 kB | Adobe PDF | View/Open | |
scopusresults 1296 .pdf Restricted Access | 63.25 kB | Adobe PDF | View/Open |
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